INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "PROCESS CONTROL FOR DOSE, FOCUS AND OVERLAY USING WEIGHTING MAPS BASED ON SPATIAL PROCESS KPIS"

GENEVA, March 11 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/041444) for "PROCESS CONTROL FOR DOSE, FOCUS, AND OVERLAY USING WEIGHTING MAPS BASED ON SPATIAL PROCESS KPIS" on Aug 11, 2025. With publication no. WO/2026/049985, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GROEGER, Philip (Schubertstrasse 3301307 Dresden)

Abstract: A modeled correction may be generated based on metrology measurements and a weighting map. Residuals between the modeled correctio...