INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "FIELD CURVATURE CORRECTOR FOR USE IN MULTI-ELECTRON-BEAM OPTICAL SYSTEM"

GENEVA, Feb. 18 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/040443) for "FIELD CURVATURE CORRECTOR FOR USE IN MULTI-ELECTRON-BEAM OPTICAL SYSTEM" on Aug 04, 2025. With publication no. WO/2026/035579, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JIANG, Xinrong (2651 South CourtPalo Alto, California 94306)

Abstract: A multi-electron-beam (MEB) imaging system may include a field curvature corrector for individually correcting electron beamlets for field curva...