GENEVA, Aug. 6 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/012635) for "AMPLITUDE ASYMMETRY MEASUREMENTS IN OVERLAY METROLOGY" on Jan 23, 2025. With publication no. WO/2025/160205, the details related to the patent application was published on Jul 31, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LEVINSKI, Vladimir (Hermon 923100 Migdal HaEmek), HILL, Andrew V. (57399 Lake Aspen LnSunriver, Oregon 97707)
Abstract:
A metrology system may include a controller to receive two or more images of the overlay target from one or more...