INTERNATIONAL PATENT: JX ADVANCED METALS CORPORATION, ＪＸ金属株式会社 FILES APPLICATION FOR "V2O3 SINTERED COMPACT, METHOD FOR PRODUCING SAME AND V2O3 SPUTTERING TARGET"

GENEVA, March 10 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2025/029941) for "V2O3 SINTERED COMPACT, METHOD FOR PRODUCING SAME, AND V2O3 SPUTTERING TARGET" on Aug 26, 2025. With publication no. WO/2026/048802, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(...