INTERNATIONAL PATENT: JX ADVANCED METALS CORPORATION, ＪＸ金属株式会社 FILES APPLICATION FOR "LA-NI-O SPUTTERING TARGET, POWDER AND METHOD FOR PRODUCING SPUTTERING TARGET"

GENEVA, May 11 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2025/036259) for "LA-NI-O SPUTTERING TARGET, POWDER, AND METHOD FOR PRODUCING SPUTTERING TARGET" on Oct 15, 2025. With publication no. WO/2026/094622, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s...