INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND AND POLYMER"

GENEVA, May 19 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2025/038569) for "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER" on Nov 04, 2025. With publication no. WO/2026/100524, the details related to the patent application was published on May 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YAMAKAWA,...