INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING AROMATIC-RING-CONTAINING COMPOUND"

GENEVA, March 30 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2025/032027) for "COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING AROMATIC-RING-CONTAINING COMPOUND" on Sep 10, 2025. With publication no. WO/2026/063319, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World...