GENEVA, Oct. 30 -- THE INSTITUTE OF OPTICS AND ELECTRONICS, THE CHINESE ACADEMY OF SCIENCES filed a patent application (CN2025/143219) for “JOINT CORRECTION METHOD FOR ELECTRON BEAM PROXIMITY EFFECT AND ETCH LOADING EFFECT, AND MASK”. With publication no. WO/2026/223103, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 7/20
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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