GENEVA, Feb. 23 -- IVALUA SAS (102 avenue de ParisCS 8105791741 Massy Cedex) filed a patent application (PCT/EP2025/073279) for "USE OF LARGE LANGUAGE MODEL IN SOURCE-TO-PAY PLATFORM" on Aug 13, 2025. With publication no. WO/2026/037885, the details related to the patent application was published on Feb 19, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): BENSOUSSAN, Pascal (805 Veterans Blvd #203Redwood City 94063), KHANH DO, Xuan (102 avenue de Paris91741 Massy Cedex)
Abstract: A computer implemented method of using a large language model (LLM) in a Source-to-Pay platform. The method compr...