International Patent: INTERFEROMETER SYSTEM, METHOD OF MEASURING A MOVEMENT OF A MEASUREMENT SURFACE WITH RESPECT TO A REFERENCE SURFACE, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS

GENEVA, June 26 -- ASML NETHERLANDS B.V. filed a patent application (EP2025/081612) for “INTERFEROMETER SYSTEM, METHOD OF MEASURING A MOVEMENT OF A MEASUREMENT SURFACE WITH RESPECT TO A REFERENCE SURFACE, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS”. With publication no. WO/2026/119474, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01B 9/02017

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....