GENEVA, Aug. 14 -- OPHIR OPTRONICS SOLUTIONS LTD. filed a patent application (IL2026/050091) for “INTERFEROMETER FOR MEASURING PROPERTIES OF DIFFRACTIVE OPTICS”. With publication no. WO/2026/167684, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01M 11/02
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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