INTERNATIONAL PATENT: INFLY TECH (SHANGHAI) CO., LTD., 无限光年（上海）技术有限公司 FILES APPLICATION FOR "MODEL OPTIMIZATION METHOD AND APPARATUS AND INFORMATION PROCESSING METHOD AND APPARATUS"

GENEVA, March 8 -- INFLY TECH (SHANGHAI) CO., LTD. (Room 1325, Floor 2, No.25-1 Hongcao RoadXuhui District, Shanghai 200233), 无限光年（上海）技术有限公司 (中国上海市徐汇区虹漕路25-1号2层1325室) filed a patent application (PCT/CN2024/140678) for "MODEL OPTIMIZATION METHOD AND APPARATUS, AND INFORMATION PROCESSING METHOD AND APPARATUS" on Dec 19, 2024. With publication no. WO/2026/045029, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which i...