INTERNATIONAL PATENT: IMEC VZW FILES APPLICATION FOR "CONTROLLED ENVIRONMENT PHOTORESIST ANALYSIS SYSTEM"

GENEVA, April 13 -- IMEC VZW (Kapeldreef 753001 Leuven) filed a patent application (PCT/EP2025/078176) for "CONTROLLED ENVIRONMENT PHOTORESIST ANALYSIS SYSTEM" on Oct 01, 2025. With publication no. WO/2026/073997, the details related to the patent application was published on Apr 09, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): POLLENTIER, Ivan (c/o IMEC VZW, patent departmentKapeldreef 753001 Leuven), HOLZMEIER, Fabian (c/o IMEC VZW, patent department Kapeldreef 753001 Leuven), DORNEY, Kevin (c/o IMEC VZW, patent department Kapeldreef 753001 Leuven), SUH, Hyo Seon (c/o IMEC VZW, patent d...