INTERNATIONAL PATENT: HUAWEI TECHNOLOGIES CO., LTD. FILES APPLICATION FOR "METHODS, APPARATUS AND SYSTEMS FOR EQUIVALENT POWER FLUX DENSITY MEASUREMENT AND FEEDBACK"

GENEVA, May 3 -- HUAWEI TECHNOLOGIES CO., LTD. (Huawei Administration Building, Bantian, Longgang DistrictShenzhen, Guangdong 518129) filed a patent application (PCT/CN2024/141915) for "METHODS, APPARATUS, AND SYSTEMS FOR EQUIVALENT POWER FLUX DENSITY MEASUREMENT AND FEEDBACK" on Dec 24, 2024. With publication no. WO/2026/086005, the details related to the patent application was published on Apr 30, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MOLLAHASANI, Shahram (Huawei Administration Building, Bantian, Longgang DistrictShenzhen, Guangdong 518129), MAAREF, Amine (Huawei Administration B...