INTERNATIONAL PATENT: HITACHI HIGH-TECH SOLUTIONS CORPORATION, 株式会社日立ハイテクソリューションズ FILES APPLICATION FOR "ESI ION SOURCE AND MASS ANALYSIS SYSTEM"

GENEVA, Sept. 21 -- HITACHI HIGH-TECH SOLUTIONS CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056410), 株式会社日立ハイテクソリューションズ (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/040621) for "ESI ION SOURCE AND MASS ANALYSIS SYSTEM" on Nov 15, 2024. With publication no. WO/2025/191932, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World I...