GENEVA, March 30 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/033462) for "ETCHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE" on Sep 19, 2024. With publication no. WO/2026/062821, the details related to the patent application was published on Mar 26, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s...