INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク, NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY, 国立大学法人群馬大学 FILES APPLICATION FOR "RADIATION IRRADIATION SYSTEM, BEAM PATH MONITORING DEVICE AND BEAM PATH MONITORING METHOD"

Posted On: 2026-01-05

GENEVA, Jan. 5 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号), NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY (2-banchi, Aramaki-machi 4-chome, Maebashi-shi, Gunma3718510), 国立大学法人群馬大学 (群馬県前橋市荒牧町四丁目２番地) filed a patent application (PCT/JP2025/001848) for "RADIATION IRRADIATION SYSTEM, BEAM PATH MONITORING DEVICE, AND BEAM P...

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INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク, NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY, 国立大学法人群馬大学 FILES APPLICATION FOR "RADIATION IRRADIATION SYSTEM, BEAM PATH MONITORING DEVICE AND BEAM PATH MONITORING METHOD"