GENEVA, Sept. 9 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代田区丸の内一丁目６番６号) filed a patent application (PCT/JP2024/041268) for "DRAWING MATCHING SYSTEM AND DRAWING MATCHING METHOD" on Nov 21, 2024. With publication no. WO/2025/182194, the details related to the patent application was published on Sep 04, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KOYAMA Akihiro (c/o HI...