INTERNATIONAL PATENT: HITACHI, LTD., 株式会社日立製作所, HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "CULTURE DEVICE AND METHOD FOR CHECKING INSTALLATION NORMALITY OF FLOW PATH FOR CULTURE DEVICE"

Posted On: 2026-04-19

GENEVA, April 19 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代田区丸の内一丁目６番６号), HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2025/023667) for "CULTURE DEVICE AND METHOD FOR CHECKING INSTALLATION NORMALITY OF FLOW PATH FOR CULTURE DEVICE" on Jul 01...

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INTERNATIONAL PATENT: HITACHI, LTD., 株式会社日立製作所, HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "CULTURE DEVICE AND METHOD FOR CHECKING INSTALLATION NORMALITY OF FLOW PATH FOR CULTURE DEVICE"