GENEVA, June 26 -- HANGZHOU ATOM TECHNOLOGY CO., LTD. filed a patent application (CN2025/140349) for “HIGH-FLOW-RATE GAS GENERATOR APPLICABLE TO CHEMICAL-VAPOR DEPOSITION DEVICE, AND HIGH-FLOW-RATE GAS SUPPLY METHOD APPLICABLE TO CHEMICAL-VAPOR DEPOSITION DEVICE”. With publication no. WO/2026/119280, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 16/455
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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