GENEVA, Feb. 10 -- HERACHEM TECHNOLOGY CO.,LTD. (2-3F,3 Dongtansandan 6-gil,Hwaseong-si,Gyeonggi-do 18487), 주식회사 헤라켐테크놀러지 (경기도화성시동탄산단6길 3, 2-3F) filed a patent application (PCT/KR2025/095433) for "PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME" on Jun 18, 2025. With publication no. WO/2026/029646, the details related to the patent application was published on Feb 05, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inve...