GENEVA, April 6 -- HANWHA SOLUTIONS CORPORATION (86, Cheonggyecheon-ro,Jung-gu,Seoul 04541), 한화솔루션 주식회사 (서울특별시중구청계천로 86) filed a patent application (PCT/IB2025/059873) for "APPARATUS FOR REMOVING RESIDUAL MONOMERS" on Oct 01, 2025. With publication no. WO/2026/069280, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AHAN, Woo Youl (86, Cheonggyecheon-ro,Jung-gu,Seoul 04541), 안&#...