GENEVA, Aug. 21 -- AGC INC. filed a patent application (JP2026/003763) for “GLASS SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK”. With publication no. WO/2026/172835, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G03F 1/60
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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