GENEVA, July 6 -- D2S, INC. filed a patent application (IB2025/054017) for “GEOMETRIC LOADING EFFECT CORRECTION FOR LITHOGRAPHY”. With publication no. WO/2026/139724, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/027
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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