International Patent: GENERATING A LAYOUT PATTERN OF AN INTEGRATED CIRCUIT DESIGN WITH AN ARTIFICIAL INTELLIGENCE PATTERN GENERATOR

GENEVA, Aug. 7 -- SIEMENS INDUSTRY SOFTWARE INC. filed a patent application (US2025/013808) for “GENERATING A LAYOUT PATTERN OF AN INTEGRATED CIRCUIT DESIGN WITH AN ARTIFICIAL INTELLIGENCE PATTERN GENERATOR”. With publication no. WO/2026/164606, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G06F 30/27

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....