GENEVA, July 1 -- AIXTRON SE filed a patent application (EP2025/086365) for “GAS SUPPLY SYSTEM FOR ONE OR MORE PROCESS CHAMBERS OF A CVD REACTOR, AND METHOD FOR DEPOSITING LAYERS”. With publication no. WO/2026/125499, here are the other details related to the patent application:
Kind: Initial Publication without ISR [A2]
IPC: C23C 16/44
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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