International Patent: GAS INTAKE ASSEMBLY, SEMICONDUCTOR PROCESS CHAMBER AND SEMICONDUCTOR PROCESS METHOD

GENEVA, Oct. 15 -- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. filed a patent application (CN2025/079232) for “GAS INTAKE ASSEMBLY, SEMICONDUCTOR PROCESS CHAMBER AND SEMICONDUCTOR PROCESS METHOD”. With publication no. WO/2025/185503, here are the other details related to the patent application:

Kind: Corrected version of pamphlet [A9]

IPC: H01L 21/67

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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