GENEVA, July 18 -- WONIK IPS CO., LTD filed a patent application (KR2025/021427) for “GAS INJECTION APPARATUS AND SUBSTRATE PROCESSING APPARATUS”. With publication no. WO/2026/151094, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 16/455
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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