INTERNATIONAL PATENT: FUJI CORPORATION, 株式会社ＦＵＪＩ FILES APPLICATION FOR "CONTROL DEVICE, PLASMA PROCESSING SYSTEM AND CONTROL METHOD"

GENEVA, Feb. 3 -- FUJI CORPORATION (19, Chausuyama, Yamamachi, Chiryu-shi, Aichi4728686), 株式会社ＦＵＪＩ (愛知県知立市山町茶碓山１９番地) filed a patent application (PCT/JP2024/026063) for "CONTROL DEVICE, PLASMA PROCESSING SYSTEM, AND CONTROL METHOD" on Jul 22, 2024. With publication no. WO/2026/022870, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JINDO Takahiro (c/o FUJI CORPORAT...