International Patent: FOCUS METROLOGY METHOD USING OVERLAY MEASUREMENT TOOL

GENEVA, Oct. 1 -- KLA CORPORATION filed a patent application (US2026/018805) for “FOCUS METROLOGY METHOD USING OVERLAY MEASUREMENT TOOL”. With publication no. WO/2026/193219, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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