GENEVA, Oct. 15 -- LOT CES CO., LTD. filed a patent application (KR2026/003614) for “EXHAUST GAS PLASMA TREATMENT APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND OPERATING METHOD THEREOF”. With publication no. WO/2026/216761, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01J 37/32
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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