International Patent: EPITAXIAL STRUCTURE OF SEMICONDUCTOR DEVICE AND PREPARATION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE

GENEVA, July 9 -- DYNAX SEMICONDUCTOR, INC. filed a patent application (CN2025/147269) for “EPITAXIAL STRUCTURE OF SEMICONDUCTOR DEVICE AND PREPARATION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/145546, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10D 62/10

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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