INTERNATIONAL PATENT: ENPULSE CO., LTD, 엔펄스 주식회사 FILES APPLICATION FOR "METHOD FOR RECOVERING SURFACE OF POLISHING PAD AND POLISHING PAD WITH LOW METAL CONTAMINATION"

GENEVA, May 11 -- ENPULSE CO., LTD (3rd Floor, 3-dong, 112, Seonggeo-gil, Seonggeo-eup, Seobuk-gu,Cheonan-si,Chungcheongnam-do 31044), 엔펄스 주식회사 (충청남도천안시서북구 성거읍 성거길 112, 제3동 3층) filed a patent application (PCT/KR2025/013107) for "METHOD FOR RECOVERING SURFACE OF POLISHING PAD AND POLISHING PAD WITH LOW METAL CONTAMINATION" on Aug 27, 2025. With publication no. WO/2026/095295, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which ...