International Patent: EFFICIENT SILICON HARDMASK COMPOSITIONS AND METHODS FOR LITHOGRAPHIC MICROELECTRONIC STRUCTURE FABRICATION

GENEVA, Aug. 21 -- BREWER SCIENCE, INC. filed a patent application (US2026/015523) for “EFFICIENT SILICON HARDMASK COMPOSITIONS AND METHODS FOR LITHOGRAPHIC MICROELECTRONIC STRUCTURE FABRICATION”. With publication no. WO/2026/174308, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/11

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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