GENEVA, Aug. 31 -- SHANGHAI VISIRAY PHOTOELECTRIC TECHNOLOGY CO., LTD. filed a patent application (CN2025/125580) for “DUAL-APERTURE MASK-BASED IMAGING LENS”. With publication no. WO/2026/174803, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G02B 13/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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