International Patent: DSRNA/SIRNA TARGET DESIGN METHOD BASED ON THERMODYNAMIC PARAMETERS, USE AND COMPUTER PROGRAM PRODUCT

GENEVA, Oct. 30 -- SILICON GENE TECH SHANGHAI CO. LTD filed a patent application (CN2025/122962) for “DSRNA/SIRNA TARGET DESIGN METHOD BASED ON THERMODYNAMIC PARAMETERS, USE AND COMPUTER PROGRAM PRODUCT”. With publication no. WO/2026/222951, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G16B 30/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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