INTERNATIONAL PATENT: DOW SILICONES CORPORATION FILES APPLICATION FOR "LOW DUST SILICONE-BASED PAPER COATING PROCESS"

GENEVA, April 29 -- DOW SILICONES CORPORATION (2211 H.H. Dow WayMidland, Michigan 48674) filed a patent application (PCT/US2025/045060) for "LOW DUST SILICONE-BASED PAPER COATING PROCESS" on Sep 05, 2025. With publication no. WO/2026/084796, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHEVALIER, Pierre (Rue Jules BordetParc Industriel Zone CB-7180 Seneffe), DONTAINE, Cathy (Rue Jules BordetParc Industriel Zone CB-7180 Seneffe), SZYMUTKO, Maxime (Rue Jules BordetParc Industriel Zone CB-7180 Seneffe)

Abstract: A proces...