INTERNATIONAL PATENT: DIC CORPORATION, ＤＩＣ株式会社 FILES APPLICATION FOR "POROUS SILICON MATERIAL, METHOD FOR PRODUCING SAME, NEGATIVE ELECTRODE ACTIVE MATERIAL CONTAINING POROUS SILICON MATERIAL, COMPOSITION FOR SECONDARY BATTERY NEGATIVE ELECTRODE, SECONDARY BATTERY NEGATIVE ELECTRODE AND SECONDARY BATTERY"

GENEVA, May 19 -- DIC CORPORATION (35-58, Sakashita 3-chome, Itabashi-ku, Tokyo1748520), ＤＩＣ株式会社 (東京都板橋区坂下三丁目３５番５８号) filed a patent application (PCT/JP2025/037034) for "POROUS SILICON MATERIAL, METHOD FOR PRODUCING SAME, NEGATIVE ELECTRODE ACTIVE MATERIAL CONTAINING POROUS SILICON MATERIAL, COMPOSITION FOR SECONDARY BATTERY NEGATIVE ELECTRODE, SECONDARY BATTERY NEGATIVE ELECTRODE, AND SECONDARY BATTERY" on Oct 21, 2025. With publication no. WO/2026/100346, the details related to the patent application was published on May 15, 2026.

Notably, the patent application was submitt...