International Patent: DETECTION APPARATUS FOR PLASMA SURFACE ETCHING PROCESS

GENEVA, Aug. 31 -- KO, Cheng-Hao filed a patent application (CN2025/078001) for “DETECTION APPARATUS FOR PLASMA SURFACE ETCHING PROCESS”. With publication no. WO/2026/174447, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/66

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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