GENEVA, Feb. 10 -- DENKA COMPANY LIMITED (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038338), デンカ株式会社 (東京都中央区日本橋室町二丁目１番１号) filed a patent application (PCT/JP2025/027188) for "CHLOROPRENE, CHLOROPRENE PRODUCTION METHOD, CHLOROPRENE-BASED POLYMER, VULCANIZED MOLDED ARTICLE, ADHESIVE COMPOSITION, COMPOSITION FOR FORMING DIP-MOLDED ARTICLE, AND DIP-MOLDED ARTICLE" on Jul 31, 2025. With publication no. WO/2026/029149, the details related to the patent application was published on Feb 05, 2026.
Notably, the patent application was submitted under the International Pat...