GENEVA, Feb. 3 -- DAI NIPPON PRINTING CO., LTD. (1-1, Ichigaya Kagacho 1-chome, Shinjuku-ku, Tokyo1628001), 大日本印刷株式会社 (東京都新宿区市谷加賀町一丁目１番１号) filed a patent application (PCT/JP2025/025464) for "IMPRINT MOLD SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND IMPRINT MOLD AND METHOD FOR MANUFACTURING SAME" on Jul 16, 2025. With publication no. WO/2026/023521, the details related to the patent application was published on Jan 29, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by th...