INTERNATIONAL PATENT: DAGIA, ANANYA NILESH, DAGIA, ANUPAM NILESH, DAGIA, NILESH MADHUKAR FILES APPLICATION FOR "A SENSOR-BASED RETRACTABLE CLOTHS DRYING SYSTEM"

GENEVA, March 9 -- DAGIA, Ananya Nilesh (F623, Rock Enclave, Hindustan Naka, Near Sahyadri Nagar, Kandivali West,Mumbai 400067), DAGIA, Anupam Nilesh ((c) 623, Rock Enclave, Hindustan Naka, Near Sahyadri Nagar, Kandivali West,Mumbai 400067), DAGIA, Nilesh Madhukar (F623, Rock Enclave, Hindustan Naka, Near Sahyadri Nagar, Kandivali West,Mumbai 400067) filed a patent application (PCT/IN2025/051385) for "A SENSOR-BASED RETRACTABLE CLOTHS DRYING SYSTEM" on Aug 29, 2025. With publication no. WO/2026/047751, the details related to the patent application was published on Mar 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organi...