INTERNATIONAL PATENT: CXMT CORPORATION, 长鑫科技集团股份有限公司 FILES APPLICATION FOR "CAPACITOR DIELECTRIC LAYER, MANUFACTURING METHOD THEREFOR AND CAPACITOR STRUCTURE"

GENEVA, Nov. 9 -- CXMT CORPORATION (No. 388, Xingye Avenue, Airport Industrial Park, Economic And Technological Development AreaHefei, Anhui 230601), 长鑫科技集团股份有限公司 (中国安徽省合肥市经济技术开发区空港工业园兴业大道388号) filed a patent application (PCT/CN2025/083698) for "CAPACITOR DIELECTRIC LAYER, MANUFACTURING METHOD THEREFOR AND CAPACITOR STRUCTURE" on Mar 20, 2025. With publication no. WO/2025/227989, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent applicatio...