International Patent: CONVEYING SYSTEM AND METHOD FOR CLEANING OF BOTH EDGE-POLISHED AND DOUBLE-SIDE-POLISHED WAFERS

GENEVA, June 26 -- ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD. filed a patent application (CN2025/103915) for “CONVEYING SYSTEM AND METHOD FOR CLEANING OF BOTH EDGE-POLISHED AND DOUBLE-SIDE-POLISHED WAFERS”. With publication no. WO/2026/118424, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/67

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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