International Patent: COMPUTATIONAL LITHOGRAPHY SIMULATION USING LINEAR-FADING-AWARE SOURCE-MASK OPTIMIZATION

GENEVA, July 6 -- ASML NETHERLANDS B.V. filed a patent application (EP2025/085410) for “COMPUTATIONAL LITHOGRAPHY SIMULATION USING LINEAR-FADING-AWARE SOURCE-MASK OPTIMIZATION”. With publication no. WO/2026/139197, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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