International Patent: CLEANING EVALUATION METHOD, CLEANING EVALUATION DEVICE, AND SUBSTRATE FOR CLEANING EVALUATION

GENEVA, Oct. 1 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/007434) for “CLEANING EVALUATION METHOD, CLEANING EVALUATION DEVICE, AND SUBSTRATE FOR CLEANING EVALUATION”. With publication no. WO/2026/191625, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 70/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....