GENEVA, Sept. 7 -- ADVANCED NANOSURFACE TECHNOLOGIES (SHENZHEN) CO.,LTD. filed a patent application (CN2025/125309) for “CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON OXIDE SUBSTRATE AND POLISHING METHOD FOR SILICON OXIDE SUBSTRATE”. With publication no. WO/2026/179165, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C09G 1/02
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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