GENEVA, April 5 -- CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 273447 Oberkochen) filed a patent application (PCT/EP2025/076654) for "OPTICAL SYSTEM, LITHOGRAPHY MACHINE HAVING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN OPTICAL SYSTEM" on Sep 18, 2025. With publication no. WO/2026/068326, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VAAS, Steffen (Rudolf-Eber-Strasse 273447 Oberkochen), HOLZ, Markus (Rudolf-Eber-Strasse 273447 Oberkochen)

Abstract: An optical system for a lithography machine comprising a plurality of...