INTERNATIONAL PATENT: CARL ZEISS SMT GMBH FILES APPLICATION FOR "METHOD FOR INSPECTING MICROLITHOGRAPHIC PHOTOMASKS, COMPUTER PROGRAM PRODUCT, SYSTEM FOR INSPECTING A MICROLITHOGRAPHIC PHOTOMASK, METHOD FOR REPAIRING A MICROLITHOGRAPHIC PHOTOMASK AND METHOD OF MICROLITHOGRAPHY"

GENEVA, May 10 -- CARL ZEISS SMT GMBH (Rudolf-Eber-StraBe 273447 Oberkochen) filed a patent application (PCT/EP2025/081160) for "METHOD FOR INSPECTING MICROLITHOGRAPHIC PHOTOMASKS, COMPUTER PROGRAM PRODUCT, SYSTEM FOR INSPECTING A MICROLITHOGRAPHIC PHOTOMASK, METHOD FOR REPAIRING A MICROLITHOGRAPHIC PHOTOMASK AND METHOD OF MICROLITHOGRAPHY" on Oct 28, 2025. With publication no. WO/2026/093323, the details related to the patent application was published on May 07, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TABBONE, Gilles (Carl-Zeiss-Promenade 1007745 Jena), FROEHLICH, Bjoern (Carl-Zeiss...