INTERNATIONAL PATENT: CARL ZEISS SMT GMBH, ASML NETHERLANDS B.V. FILES APPLICATION FOR "LIGHT SOURCE MODULE FOR EUV LIGHT, EUV COLLECTOR MIRROR AND APERTURE INSERT THEREFOR"

GENEVA, March 2 -- CARL ZEISS SMT GMBH (Rudolf-Eber-StraBe 273447 Oberkochen), ASML NETHERLANDS B.V. (De Run 65015504 DR Veldhoven) filed a patent application (PCT/EP2025/072746) for "LIGHT SOURCE MODULE FOR EUV LIGHT, EUV COLLECTOR MIRROR AND APERTURE INSERT THEREFOR" on Aug 07, 2025. With publication no. WO/2026/041443, the details related to the patent application was published on Feb 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HARRISON, Kramer Daniel (De Run 65015504 DR Veldhoven), VAN DER VEEN, Paul (De Run 65015504 DR Veldhoven), JURNA, Martin (De Run 65015504 DR Veldhoven), KO...